XJP-607A
Product Description:
JP-607A industrial microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
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Viewing Head
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Compensation Free Trinocular Head, Inclined 30°（50mm-75mm）
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Eyepiece
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WF10×/25mm
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WF10×/20mm,crosshair with reticule 0.1mm
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Objective
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Long working distance Infinite Plan Apochromatic objectives:5
×/0.15/W.D.35mm、10×/0.28/W.D.35mm、20×/0.40/W.D.20mm、50
×/0.55/W.D.13mm
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Nosepiece
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Quadruple nosepiece with center adjustable
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Stage
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Double layer mechanical stage
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Stage Size: 190mm×140mm
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Moving Range:50mm×40mm
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Filter
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Flashboard type Filters:(green,blue,neutral)
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Focusing
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Coaxial coarse ＆fine focusing adjustment with rack and pinion mechanism.Fine
focusing scale value 0.002mm
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Light Source
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With aperture iris diaphragm and field iris diaphragm,halogen bulb 12V/50W, AC
85V-230V, brightness adjustable
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Polarizing Device
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Analyzer rotatable 360,°Polarizer＆Analyzer can be moved in/out of the optical path
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Checking Tool
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0.01mm Micrometer
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Optional Accessory
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Two-dimensional measurement software
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Professional metallurgical image analysis software
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Micrometer eyepiece
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1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS. Digital camera eyepieces
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Halogen Bulb 12V/100W
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Precision Stage:X-Y moving range 25mm×25mm,Moving Precision＜5um,Digital
hand wheel Min.Value:0.1um,360°Rotatable disc
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Photography attachmentand CCD Adapter 0.5×、0.57×、0.75×
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Objective: 2×
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Planishing tool
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CCD Camera,colour 1/3″High resolution 520 TV lines
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Characteristicsand description
1. Adopt UIS High-resolution, Long working distance, and infinity light path
correcting system objective imaging technology.
2. Extending the multiplexing technology of objective, compatible infinity
objective with all the observation methods.
3. Aspherical surface Kohler illumination, increasing the viewing brightness.
4. WF10×（Φ25）super wide viewing field Eyepiece.
Micrometer Eyepiece is accessory for a variety of optical measuring instruments ,when assembled on an appropriate optical instrument, it can be used for various measurements, such as measuring the holes′distance, width and length of the graduation scale and keyways, metal surface quality, spectrum bandwidth, the density of fiber fabric and the field specimens and so on, it can also measure the size of indentation and scratch as accessory of some micro hardness tester.
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