XJP-405
Product Description:
XJP-405 industrial microscope is equipped with a large moving range mechanical stage, Epi-illuminator, long working distance bright and dark field Infinite Plan objectives, wide field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufacturing, electronic in formation industry, metallurgical industry, and used as high grade industrial microscope. Bright ＆ Dark field observation, EPI-polarizing and DIC observation can proceed. It is widely used in Factories, Research institution and college and Universities to identify and analyze Wafer,FPD,Circuit substrate,Precision moulds.
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Specification
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Viewing Head
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Compensation Free Trinocular Head, Inclined 30°（50mm-75mm）
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Eyepiece
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WF10×/25mm
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WF10×/20mm,crosshair with reticule 0.1mm
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Nosepiece
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Quintuple Nosepiece with DIC Jack
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Objective
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Long working distance bright and dark field Infinite Plan objectives:
5 ×/0.1B.D/W.D.29.4mm 10×/0.25B.D/W.D.16mm 20×/0.40B.D/W.D.10.6mm 40
×/0.60B.D/W.D.5.4mm
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Stage
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Double layer mechanical stage
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Stage Size: 350mm×310mm
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Moving Range:250mm×250mm
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Filter
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Flashboard type filters(green,blue,neutral)
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Focusing
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Coaxial coarse ＆fine focusing adjustment With rack and pinion mechanism Fine
focusing scale value 0.002mm
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Light Source
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Epi-illumination:With aperture iris diaphragm and field iris Diaphragm, Halogen
Bulb 12V/100W, AC85V-230V, Brightness Adjustable
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Polarizing Device
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Analyzer rotatable 360,°Polariaer＆Analyzer can be moved in/out of the optical path
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Checking Tool
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0.01mm Micrometer
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Optional Accessory
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Eyepiece: WF15×/17mm、WF20×/12.5mm
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1.3Mega、2.0 Mega、3.0 Mega、5.0 Mega pixels CMOS Digital camera eyepiece
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Long working distance bright and dark field Infinite Plan objectives: 50
×/0.55B.D/W.D.5.1mm、 80×/0.75B.D/W.D.4mm、100×/0.80B.D/W.D.3mm
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Two-dimensional measurement software
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Professional metallurgical image analysis software
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DIC（10×、20×、40×、100×）
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Photography attachment and CCD Adapter 0.5×、0.57×、0.75×
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Planish tool
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CCD Camera,colour 1/3″High resolution 520 TV lines
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Characteristicsand description
1. Adopt UIS High-resolution, Long working distance, and infinity light path
correcting system objective imaging technology
2. Extending the multiplexing technology of objective, compatible infinity
objective with all the observation methods. including bright ＆ dark field
observation, polarization and also provide with high clear and sharp image in
each observation method.
3. Aspherical surface Kohler illumination, increasing the viewing brightness.
4. WF10 X（Φ25）super wide field Eyepiece, long working distance
metallurgical objective with bright and dark field
5. The Nosepiece can be equipped with detachable DIC differential interference
device.
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